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US Patent 10442056 Substrate holding apparatus and polishing apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
June 27, 2013
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Date of Patent
October 15, 2019
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Patent Application Number
13929295
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Patent Citations Received
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US Patent D1007449 Target profile for a physical vapor deposition chamber target
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US Patent D970566 Sputter target for a physical vapor deposition chamber
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US Patent D894137 Target profile for a physical vapor deposition chamber target
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US Patent D902165 Target profile for a physical vapor deposition chamber target
0
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US Patent D908645 Sputtering target for a physical vapor deposition chamber
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US Patent D946638 Target profile for a physical vapor deposition chamber target
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US Patent 11752590 Polishing head and polishing apparatus
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US Patent D966357 Target profile for a physical vapor deposition chamber target
Patent Inventor Names
Keisuke Namiki
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Makoto Fukushima
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Osamu Nabeya
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Hozumi Yasuda
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10442056
0
Patent Primary Examiner
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Brian D Keller
0

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