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US Patent 10410933 Replacement metal gate patterning for nanosheet devices

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
May 23, 2017
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Date of Patent
September 10, 2019
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Patent Application Number
15602225
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Patent Citations
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US Patent 10103065 Gate metal patterning for tight pitch applications
Patent Citations Received
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US Patent 12132091 Work function layers for transistor gate electrodes
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US Patent 10615257 Patterning method for nanosheet transistors
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US Patent 10734286 Multiple dielectrics for gate-all-around transistors
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US Patent 11264285 Method for forming film stacks with multiple planes of transistors having different transistor architectures
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US Patent 11664656 ESD protection for integrated circuit devices
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US Patent 11368016 ESD protection for integrated circuit devices
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US Patent 12068386 Semiconductor devices and methods of forming the same
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Patent Inventor Names
Min Gyu Sung
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Guowei Xu
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Hoon Kim
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Chanro Park
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Ruilong Xie
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Hui Zang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10410933
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Patent Primary Examiner
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Mohsen Ahmadi
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