A hand rest device for use during the application of nail polish comprising a front, a back, a right side, a left side, a top surface, and a bottom surface, with said top surface configured in a generally convex shape having a rounded peak positioned near the back half of the top surface longitudinally and about the middle of the top surface laterally. The top surface of the device curves down from said peak to an outer edge of the hand rest device. The bottom surface is configured with a curved portion from the outer edge of the hand rest device (around the perimeter) down to a generally flat portion, the generally flat portion further comprising a plurality of rubber pads. The device could include a weight inside.