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US Patent 10379445 Metrology method, target and substrate
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Patent
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Date Filed
October 30, 2018
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Date of Patent
August 13, 2019
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Patent Application Number
16174398
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Patent Citations
US Patent 10133188 Metrology method, target and substrate
Patent Citations Received
US Patent 11359916 Darkfield imaging of grating target structures for overlay measurement
US Patent 12021040 Overlay mark forming Moire pattern, overlay measurement method using same, and manufacturing method of semiconductor device using same
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US Patent 11428642 Scanning scatterometry overlay measurement
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US Patent 10809193 Inspection apparatus having non-linear optics
Patent Inventor Names
Arie Jeffrey Den Boef
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Martin Ebert
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Martin Jacobus Johan Jak
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10379445
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Patent Primary Examiner
Peter B. Kim
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