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US Patent 10370761 Pulsed valve manifold for atomic layer deposition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
January 6, 2017
Date of Patent
August 6, 2019
Patent Application Number
15400793
Patent Citations Received
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US Patent 11830731 Semiconductor deposition reactor manifolds
0
‌
US Patent 11492701 Reactor manifolds
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US Patent 11746417 Clean isolation valve for reduced dead volume
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US Patent 11377737 Manifolds for uniform vapor deposition
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US Patent 11479857 Clean isolation valve for reduced dead volume
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US Patent 10971340 Gas injector for reaction regions
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10370761
Patent Primary Examiner
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Rudy Zervigon

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