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US Patent 10324050 Measurement system optimization for X-ray based metrology

Patent 10324050 was granted and assigned to KLA-Tencor on June, 2019 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
KLA-Tencor
KLA-Tencor
Date Filed
January 13, 2016
Date of Patent
June 18, 2019
Patent Applicant
KLA-Tencor
KLA-Tencor
Patent Application Number
14994817
Patent Citations Received
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US Patent 12085515 Methods and systems for selecting wafer locations to characterize cross-wafer variations based on high-throughput measurement signals
0
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US Patent 12019030 Methods and systems for targeted monitoring of semiconductor measurement quality
0
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US Patent 12025575 Soft x-ray optics with improved filtering
0
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US Patent 11519869 Methods and systems for real time measurement control
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US Patent 11520321 Measurement recipe optimization based on probabilistic domain knowledge and physical realization
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US Patent 11530913 Methods and systems for determining quality of semiconductor measurements
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US Patent 11604063 Self-calibrated overlay metrology using a skew training sample
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US Patent 11604420 Self-calibrating overlay metrology
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US Patent 11610297 Tomography based semiconductor measurements using simplified models
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US Patent 11313809 Process control metrology
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10324050
Patent Primary Examiner
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Mohammed Shamsuzzaman

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