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US Patent 10319604 Methods for self-aligned patterning

Patent 10319604 was granted and assigned to Applied Materials on June, 2019 by the United States Patent and Trademark Office.

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Patent abstract

Processing methods comprising depositing a film on a substrate surface and in a surface feature with chemical planarization to remove the film from the substrate surface, leaving the film in the feature. A pillar is grown from the film so that the pillar grows orthogonally to the substrate surface.

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Infobox
Patent Citations Received
‌
US Patent 11705366 Methods for controllable metal and barrier-liner recess
0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1031960400
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
103196040
Date of Patent
June 11, 2019
0
Patent Application Number
158057640
Date Filed
November 7, 2017
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=103196040
Patent Citations
‌
US Patent 10083834 Methods of forming self-aligned vias
0
Patent Citations Received
‌
US Patent 10510602 Methods of producing self-aligned vias
0
‌
US Patent 10553485 Methods of producing fully self-aligned vias and contacts
0
‌
US Patent 10573555 Methods of producing self-aligned grown via
0
‌
US Patent 10593594 Selectively etched self-aligned via processes
0
‌
US Patent 10600688 Methods of producing self-aligned vias
0
‌
US Patent 10636659 Selective deposition for simplified process flow of pillar formation
0
‌
US Patent 10699952 Deposition and treatment of films for patterning
0
‌
US Patent 10699953 Method for creating a fully self-aligned via
0
‌
US Patent 10741435 Oxidative volumetric expansion of metals and metal containing compounds
0
‌
US Patent 10770349 Critical dimension control for self-aligned contact patterning
0
‌
US Patent 10790191 Selective removal process to create high aspect ratio fully self-aligned via
0
‌
US Patent 10840186 Methods of forming self-aligned vias and air gaps
0
‌
US Patent 10892183 Methods for removing metal oxides
0
‌
US Patent 10892187 Method for creating a fully self-aligned via
0
‌
US Patent 10930503 Geometric control of bottom-up pillars for patterning applications
0
‌
US Patent 11037825 Selective removal process to create high aspect ratio fully self-aligned via
0
‌
US Patent 11062942 Methods for controllable metal and barrier-liner recess
0
Patent Primary Examiner
‌
Mounir S Amer
0
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
103196040
Date of Patent
June 11, 2019
0
Patent Application Number
158057640
Date Filed
November 7, 2017
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=103196040
Patent Citations
‌
US Patent 10083834 Methods of forming self-aligned vias
0
Patent Citations Received
‌
US Patent 10510602 Methods of producing self-aligned vias
0
‌
US Patent 10553485 Methods of producing fully self-aligned vias and contacts
0
‌
US Patent 10573555 Methods of producing self-aligned grown via
0
‌
US Patent 10593594 Selectively etched self-aligned via processes
0
‌
US Patent 10600688 Methods of producing self-aligned vias
0
‌
US Patent 10636659 Selective deposition for simplified process flow of pillar formation
0
‌
US Patent 10699952 Deposition and treatment of films for patterning
0
‌
US Patent 10699953 Method for creating a fully self-aligned via
0
‌
US Patent 10741435 Oxidative volumetric expansion of metals and metal containing compounds
0
‌
US Patent 10770349 Critical dimension control for self-aligned contact patterning
0
‌
US Patent 10790191 Selective removal process to create high aspect ratio fully self-aligned via
0
‌
US Patent 10840186 Methods of forming self-aligned vias and air gaps
0
‌
US Patent 10892183 Methods for removing metal oxides
0
‌
US Patent 10892187 Method for creating a fully self-aligned via
0
‌
US Patent 10930503 Geometric control of bottom-up pillars for patterning applications
0
‌
US Patent 11037825 Selective removal process to create high aspect ratio fully self-aligned via
0
‌
US Patent 11062942 Methods for controllable metal and barrier-liner recess
0
Patent Primary Examiner
‌
Mounir S Amer
0
"update citations for inverse infoboxes"
Golden AI profile picture
Golden AI
edited on 26 Sep, 2022
Edits on 26 Sep, 2022
"update citations for inverse infoboxes"
Golden AI profile picture
Golden AI
edited on 26 Sep, 2022

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