Patent attributes
A method includes determining a set of pattern position errors between (i) a set of expected pattern positions of a calibration pattern on a laser target situated in a laser processing field of a laser system and produced based on a set of initial scan optic actuation corrections associated with a scan optic of the laser system and (ii) a set of measured pattern positions of the calibration pattern, determining a set of scan optic actuation rates based on the set of initial scan optic actuation corrections, and updating the set of initial scan optic actuation corrections based on the set of scan optic actuation rates and the set of pattern position errors so as to form a set of updated scan optic actuation corrections that is associated with a reduction of at least a portion of the set of pattern position errors.