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US Patent 10221480 Substrate processing apparatus and substrate processing method

Patent 10221480 was granted and assigned to Tokyo Electron on March, 2019 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Tokyo Electron
Tokyo Electron
Date Filed
September 2, 2016
Date of Patent
March 5, 2019
Patent Applicant
Tokyo Electron
Tokyo Electron
Patent Application Number
15255565
Patent Citations Received
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US Patent 12080571 Substrate processing module and method of moving a workpiece
0
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US Patent 11749542 Apparatus, system, and method for non-contact temperature monitoring of substrate supports
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US Patent 12002668 Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool
0
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US Patent 10428425 Film deposition apparatus, method of depositing film, and non-transitory computer-readable recording medium
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US Patent 10584416 Substrate processing apparatus
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US Patent 10998209 Substrate processing platforms including multiple processing chambers
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US Patent 11600507 Pedestal assembly for a substrate processing chamber
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US Patent 11610799 Electrostatic chuck having a heating and chucking capabilities
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US Patent 11674227 Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
0
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US Patent 11674225 Substrate processing apparatus
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10221480
Patent Primary Examiner
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Charlee J. C. Bennett

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