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US Patent 10217596 High temperature annealing in X-ray source fabrication

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
September 29, 2016
Date of Patent
February 26, 2019
Patent Application Number
15280701
Patent Citations Received
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US Patent 11056308 System and method for depth-selectable x-ray analysis
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US Patent 10976273 X-ray spectrometer system
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US Patent 10989822 Wavelength dispersive x-ray spectrometer
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US Patent RE48612 X-ray interferometric imaging system
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US Patent 10466185 X-ray interrogation system using multiple x-ray beams
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US Patent 10578566 X-ray emission spectrometer system
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US Patent 10653376 X-ray imaging system
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US Patent 10656105 Talbot-lau x-ray source and interferometric system
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US Patent 10658145 High brightness x-ray reflection source
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US Patent 10845491 Energy-resolving x-ray detection system
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10217596
Patent Primary Examiner
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Courtney D Thomas

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