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US Patent 10115609 Separation and regeneration apparatus and substrate processing apparatus

Patent 10115609 was granted and assigned to Tokyo Electron on October, 2018 by the United States Patent and Trademark Office.

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Patent abstractTimelineTable: Further ResourcesReferences
Is a
Patent
Patent
1

Patent attributes

Patent Applicant
Tokyo Electron
Tokyo Electron
1
Current Assignee
Tokyo Electron
Tokyo Electron
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
101156091
Patent Inventor Names
Takehiko Orii1
Hiroki Ohno1
Kazuyuki Mitsuoka1
Takayuki Toshima1
Date of Patent
October 30, 2018
1
Patent Application Number
146444581
Date Filed
March 11, 2015
1
Patent Citations Received
‌
US Patent 11752515 Coating apparatus and coating method
Patent Primary Examiner
‌
Spencer E. Bell
1
Patent abstract

Disclosed is a separation and regeneration apparatus including: a supercritical processing unit configured to generate a mixed gas including a first fluorine-containing organic solvent having a first boiling point and a second fluorine-containing organic solvent having a second boiling point lower than the first boiling point; and a distillation tank configured to store hot water having a temperature between the first boiling point and the second boiling point, in which the mixed gas is input into the hot water to be separated into the first fluorine-containing organic solvent in a liquid state and the second fluorine-containing organic solvent in a gas state, in which an introduction line configured to guide the mixed gas from the supercritical processing unit to the distillation tank is provided and a distal end of the introduction line is disposed in the hot water.

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