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US Patent 10109459 Substrate treating apparatus, substrate treating method, and plasma generating unit

Patent 10109459 was granted and assigned to PSK on October, 2018 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
PSK
PSK
Current Assignee
PSK
PSK
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10109459
Date of Patent
October 23, 2018
Patent Application Number
15683835
Date Filed
August 23, 2017
Patent Citations Received
‌
US Patent 11495435 Substrate processing apparatus, non-transitory computer-readable recording medium, method of manufacturing semiconductor device, and a substrate processing method
Patent Primary Examiner
‌
Alexander H Taningco
Patent abstract

Disclosed are a substrate treating The substrate treating apparatus includes a plasma generating unit the plasma generating unit includes a plasma generating chamber having a space, into which a gas is introduced, a first antenna wound to surround the plasma generating chamber and connected to a power source through a first electric wire, a second antenna wound to surround the housing and connected to the power source through a second electric wire to be disposed in parallel to the first antenna, and power distributing members provided in the first antenna and the second antenna to distribute electric power supplied from the power source to the first antenna and the second antenna.

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