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US Patent 10103277 Method for manufacturing oxide semiconductor film

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
July 13, 2017
Date of Patent
October 16, 2018
Patent Application Number
15648943
Patent Citations Received
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US Patent 11967505 Method for manufacturing sputtering target, method for forming oxide film, and transistor
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US Patent 10964821 Method for manufacturing semiconductor device
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US Patent 11063066 C-axis alignment of an oxide film over an oxide semiconductor film
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US Patent 11637015 Method for manufacturing sputtering target, method for forming oxide film, and transistor
0
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US Patent 11705522 Semiconductor device and method for manufacturing the same
0
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US Patent 11757007 Metal oxide film and semiconductor device
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US Patent 11764074 Semiconductor device
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US Patent 11380799 Oxide semiconductor film and semiconductor device
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US Patent 11380802 Method for manufacturing semiconductor device
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US Patent 11430894 Semiconductor device including a oxide semiconductor transistor
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•••
Patent Inventor Names
Tatsuya Honda
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Masashi Tsubuku
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Shunpei Yamazaki
0
Takatsugu Omata
0
Yusuke Nonaka
0
Akiharu Miyanaga
0
Hiroki Ohara
0
Kengo Akimoto
0
Masahiro Takahashi
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10103277
Patent Primary Examiner
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Dung Le

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