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US Patent 10103155 Semiconductor memory device

Patent 10103155 was granted and assigned to Toshiba Memory Corporation on October, 2018 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Toshiba Memory Corporation
Toshiba Memory Corporation
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Current Assignee
Toshiba Memory Corporation
Toshiba Memory Corporation
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
101031550
Patent Inventor Names
Yuta Watanabe0
Satoshi Nagashima0
Tatsuya Kato0
Toshiyuki Iwamoto0
Fumitaka Arai0
Keisuke Kikutani0
Kohei Sakaike0
Koichi Sakata0
Date of Patent
October 16, 2018
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Patent Application Number
154494810
Date Filed
March 3, 2017
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Patent Citations Received
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US Patent 11956962 Three-dimensional flash memory device with increased storage density
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US Patent 10546868 Semiconductor memory device including an insulating portion adjacent to first and second pluralities of conductive layers
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US Patent 11282850 Semiconductor memory device having a charge accumulating layer including aluminum, oxygen, and nitrogen
Patent Primary Examiner
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Mark Prenty
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Patent abstract

A semiconductor memory device according to an embodiment, includes a first semiconductor member, a second semiconductor member, an insulating member, a plurality of electrode films, a first electrode, and a second electrode. The first semiconductor member and the second semiconductor member are separated in a first direction and extending in a second direction. The second direction crosses the first direction. The insulating member is provided between the first semiconductor member and the second semiconductor member. The plurality of electrode films are arranged to be separated from each other along the second direction. Each of the electrode films surrounds the first semiconductor member, the second semiconductor member, and the insulating member when viewed from the second direction. The first electrode is provided between the first semiconductor member and the electrode film. The second electrode is provided between the second semiconductor member and the electrode film.

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