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US Patent 10083830 Substrate cleaning method for removing oxide film

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

May 23, 2016

Date of Patent

September 25, 2018

Patent Application Number

15161892

Patent Citations Received

US Patent 11417534 Selective material removal

US Patent 11437242 Selective removal of silicon-containing materials

US Patent 11476093 Plasma etching systems and methods with secondary plasma injection

US Patent 10424463 Oxide etch selectivity systems and methods

US Patent 10424464 Oxide etch selectivity systems and methods

US Patent 10490406 Systems and methods for material breakthrough

US Patent 10490418 Systems and methods for internal surface conditioning assessment in plasma processing equipment

US Patent 10497573 Selective atomic layer etching of semiconductor materials

US Patent 10504754 Systems and methods for improved semiconductor etching and component protection

US Patent 10522371 Systems and methods for improved semiconductor etching and component protection

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

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