US Patent 10072328 High-precision shadow-mask-deposition system and method therefor
Patent 10072328 was granted and assigned to EMagin on September, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
May 17, 2017
Date of Patent
September 11, 2018
Patent Applicant
Patent Application Number
15597635
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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