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US Patent 10020162 Beam alignment method and electron microscope

Patent 10020162 was granted and assigned to JEOL on July, 2018 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
JEOL
JEOL
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
100201621
Patent Inventor Names
Yuko Shimizu1
Akira Yasuhara1
Fumio Hosokawa1
Kazuya Yamazaki1
Date of Patent
July 10, 2018
1
Patent Application Number
154515461
Date Filed
March 7, 2017
1
Patent Primary Examiner
‌
Andrew Smyth
1
Patent abstract

There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (−X) relative to the reference axis, the second direction (−X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.

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