SBIR/STTR Award attributes
We will conduct a detailed experimental study toward the development of a manufacturable delineation process for dual band mid-wave and long-wave infrared (MWIR/LWIR) focal plane arrays (FPA) based on nBn, InAs/InAsSb, Type II Superlattice (T2SL) structures. We will build on the successful Phase I effort where we demonstrated an 8.65 µm deep etch with a high aspect ratio (3:1 to 4:1) and a V-grooved angle at the bottom of 68-70° that achieves excellent total internal reflection (TIR). In addition, the Phase II effort will demonstrate quantitative etched surface measurements to minimize potential surface contaminants as well as a back-side illuminated fanout array with deep etched pixels measuring leakage currents for dual band superlattice detector materials.
