List of D2S Inc. patents

Patents where

Current Assignee

Name

D2S Inc.

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 7754401 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography	Patent 7754401 was granted and assigned to D2S Inc. on July, 2010 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	7754401	July 13, 2010
‌ US Patent 9400857 Method and system for forming patterns using charged particle beam lithography	Patent 9400857 was granted and assigned to D2S Inc. on July, 2016 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9400857	July 26, 2016
‌ US Patent 8719739 Method and system for forming patterns using charged particle beam lithography	Patent 8719739 was granted and assigned to D2S Inc. on May, 2014 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	8719739	May 6, 2014
‌ US Patent 10460071 Shaped beam lithography including temperature effects	Patent 10460071 was granted and assigned to D2S Inc. on October, 2019 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	10460071	October 29, 2019
‌ US Patent 9343267 Method and system for dimensional uniformity using charged particle beam lithography	Patent 9343267 was granted and assigned to D2S Inc. on May, 2016 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9343267	May 17, 2016
‌ US Patent 11604451 Method and system of reducing charged particle beam write time		D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11604451	March 14, 2023
‌ US Patent 11592802 Method and system of reducing charged particle beam write time		D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11592802	February 28, 2023
‌ US Patent 9323140 Method and system for forming a pattern on a reticle using charged particle beam lithography	Patent 9323140 was granted and assigned to D2S Inc. on April, 2016 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9323140	April 26, 2016
‌ US Patent 8938696 Techniques of optical proximity correction using GPU	Patent 8938696 was granted and assigned to D2S Inc. on January, 2015 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	8938696	January 20, 2015
‌ US Patent 8745555 Method for integrated circuit design and manufacture using diagonal minimum-width patterns	Patent 8745555 was granted and assigned to D2S Inc. on June, 2014 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	8745555	June 3, 2014
‌ US Patent 10909294 Modeling of a design in reticle enhancement technology	Patent 10909294 was granted and assigned to D2S Inc. on February, 2021 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	10909294	February 2, 2021
‌ US Patent 9038003 Method and system for critical dimension uniformity using charged particle beam lithography	Patent 9038003 was granted and assigned to D2S Inc. on May, 2015 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9038003	May 19, 2015
‌ US Patent 9057956 Method and system for design of enhanced edge slope patterns for charged particle beam lithography	Patent 9057956 was granted and assigned to D2S Inc. on June, 2015 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	9057956	June 16, 2015
‌ US Patent 8221939 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages	Patent 8221939 was granted and assigned to D2S Inc. on July, 2012 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	8221939	July 17, 2012
‌ US Patent 9043734 Method and system for forming high accuracy patterns using charged particle beam lithography	Patent 9043734 was granted and assigned to D2S Inc. on May, 2015 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9043734	May 26, 2015
‌ US Patent 11620425 Methods for modeling of a design in reticle enhancement technology	Patent 11620425 was granted and assigned to D2S Inc. on April, 2023 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11620425	April 4, 2023
‌ US Patent 11301610 Methods for modeling of a design in reticle enhancement technology	Patent 11301610 was granted and assigned to D2S Inc. on April, 2022 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11301610	April 12, 2022
‌ US Patent 8062813 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography	Patent 8062813 was granted and assigned to D2S Inc. on November, 2011 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	8062813	November 22, 2011
‌ US Patent 11062878 Method and system for determining a charged particle beam exposure for a local pattern density	Patent 11062878 was granted and assigned to D2S Inc. on July, 2021 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11062878	July 13, 2021
‌ US Patent 11264206 Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography	Patent 11264206 was granted and assigned to D2S Inc. on March, 2022 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11264206	March 1, 2022
‌ US Patent 11263496 Methods and systems to classify features in electronic designs	Patent 11263496 was granted and assigned to D2S Inc. on March, 2022 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	11263496	March 1, 2022
‌ US Patent 9612530 Method and system for design of enhanced edge slope patterns for charged particle beam lithography	Patent 9612530 was granted and assigned to D2S Inc. on April, 2017 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	9612530	April 4, 2017
‌ US Patent 8959463 Method and system for dimensional uniformity using charged particle beam lithography	Patent 8959463 was granted and assigned to D2S Inc. on February, 2015 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	8959463	February 17, 2015
‌ US Patent 7772575 Stencil design and method for cell projection particle beam lithography	Patent 7772575 was granted and assigned to D2S Inc. on August, 2010 by the United States Patent and Trademark Office.		D2S Inc.	United States Patent and Trademark Office	7772575	August 10, 2010
‌ US Patent 8949750 Method and system for forming a diagonal pattern using charged particle beam lithography	Patent 8949750 was granted and assigned to D2S Inc. on February, 2015 by the United States Patent and Trademark Office.	D2S Inc.	D2S Inc.	United States Patent and Trademark Office	8949750	February 3, 2015

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