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List of AIXTRON AG patents

Patents where

Current Assignee

Name

‌

AIXTRON AG

Name	Description	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 7033921 Method and device for depositing crystalline layers on crystalline substrates	Patent 7033921 was granted and assigned to AIXTRON AG on April, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7033921	April 25, 2006
‌ US Patent 7294207 Gas-admission element for CVD processes, and device	Patent 7294207 was granted and assigned to AIXTRON AG on November, 2007 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7294207	November 13, 2007
‌ US Patent 7625448 Inlet system for an MOCVD reactor	Patent 7625448 was granted and assigned to AIXTRON AG on December, 2009 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7625448	December 1, 2009
‌ US Patent 7410670 Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit	Patent 7410670 was granted and assigned to AIXTRON AG on August, 2008 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7410670	August 12, 2008
‌ US Patent 7128785 Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates	Patent 7128785 was granted and assigned to AIXTRON AG on October, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7128785	October 31, 2006
‌ US Patent 7128786 Process for depositing III-V semiconductor layers on a non-III-V substrate	Patent 7128786 was granted and assigned to AIXTRON AG on October, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7128786	October 31, 2006
‌ US Patent 6899764 Chemical vapor deposition reactor and process chamber for said reactor	Patent 6899764 was granted and assigned to AIXTRON AG on May, 2005 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	6899764	May 31, 2005
‌ US Patent 7135073 Method and system for semiconductor crystal production with temperature management	Patent 7135073 was granted and assigned to AIXTRON AG on November, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7135073	November 14, 2006
‌ US Patent 7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates	Patent 7147718 was granted and assigned to AIXTRON AG on December, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7147718	December 12, 2006
‌ US Patent 7473316 Method of growing nitrogenous semiconductor crystal materials	Patent 7473316 was granted and assigned to AIXTRON AG on January, 2009 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7473316	January 6, 2009
‌ US Patent 7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates	Patent 7332038 was granted and assigned to AIXTRON AG on February, 2008 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7332038	February 19, 2008
‌ US Patent 7524532 Process for depositing thin layers on a substrate in a process chamber of adjustable height	Patent 7524532 was granted and assigned to AIXTRON AG on April, 2009 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7524532	April 28, 2009
‌ US Patent 7282096 Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereon	Patent 7282096 was granted and assigned to AIXTRON AG on October, 2007 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7282096	October 16, 2007
‌ US Patent 7762208 Loading and unloading apparatus for a coating device	Patent 7762208 was granted and assigned to AIXTRON AG on July, 2010 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7762208	July 27, 2010
‌ US Patent 7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned	Patent 7709398 was granted and assigned to AIXTRON AG on May, 2010 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7709398	May 4, 2010
‌ US Patent 7201942 Coating method	Patent 7201942 was granted and assigned to AIXTRON AG on April, 2007 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7201942	April 10, 2007
‌ US Patent 8052796 CVD reactor comprising a photodiode array	Patent 8052796 was granted and assigned to AIXTRON AG on November, 2011 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	8052796	November 8, 2011
‌ US Patent 8152927 CVD coating device	Patent 8152927 was granted and assigned to AIXTRON AG on April, 2012 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	8152927	April 10, 2012
‌ US Patent 7048802 CVD reactor with graphite-foam insulated, tubular susceptor	Patent 7048802 was granted and assigned to AIXTRON AG on May, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7048802	May 23, 2006
‌ US Patent 6908838 Method and device for treating semiconductor substrates	Patent 6908838 was granted and assigned to AIXTRON AG on June, 2005 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	6908838	June 21, 2005
‌ US Patent 7078318 Method for depositing III-V semiconductor layers on a non-III-V substrate	Patent 7078318 was granted and assigned to AIXTRON AG on July, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7078318	July 18, 2006
‌ US Patent 6962624 Method and device for depositing in particular organic layers using organic vapor phase deposition	Patent 6962624 was granted and assigned to AIXTRON AG on November, 2005 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	6962624	November 8, 2005
‌ US Patent 7056388 Reaction chamber with at least one HF feedthrough	Patent 7056388 was granted and assigned to AIXTRON AG on June, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7056388	June 6, 2006
‌ US Patent 7067012 CVD coating device	Patent 7067012 was granted and assigned to AIXTRON AG on June, 2006 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	7067012	June 27, 2006
‌ US Patent 6905548 Device for the deposition of crystalline layers on crystalline substrates	Patent 6905548 was granted and assigned to AIXTRON AG on June, 2005 by the United States Patent and Trademark Office.	‌ AIXTRON AG	United States Patent and Trademark Office	6905548	June 14, 2005

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