Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Motoshi Sawada1
Date of Patent
January 16, 2018
1Patent Application Number
146727951
Date Filed
March 30, 2015
1Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate processing apparatus includes a shower head configured to disperse a gas; a process vessel installed at a downstream side of the shower head and configured to have a process space that allows a substrate to be processed by a process gas therein; a gas supplier connected to the shower head; a shower head gas exhauster connected to the shower head; and a capturing assembly configured to capture a component different from the process gas within the shower head.
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