US Patent 9869022 Substrate processing apparatus
Patent 9869022 was granted and assigned to Hitachi Kokusai Electric Inc. on January, 2018 by the United States Patent and Trademark Office.
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Patent abstract
A substrate processing apparatus includes a shower head configured to disperse a gas; a process vessel installed at a downstream side of the shower head and configured to have a process space that allows a substrate to be processed by a process gas therein; a gas supplier connected to the shower head; a shower head gas exhauster connected to the shower head; and a capturing assembly configured to capture a component different from the process gas within the shower head.
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Patent Inventor Names
Motoshi Sawada0
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US Patent 09869022 Substrate processing apparatus US Patent 9869022 Substrate processing apparatus
Infobox
Patent Number
098690220
Patent Number
98690220
Edits on 24 Apr, 2023
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Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
098690220
Date of Patent
January 16, 2018
0Patent Application Number
146727950
Date Filed
March 30, 2015
0Patent Primary Examiner
Edits on 16 Jan, 2022
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US Patent 09869022 Substrate processing apparatus
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
09869022
Date of patent
January 16, 2018
Patent application number
14672795
Date Filed
March 30, 2015
Patent primary examiner
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