Patent 7927454 was granted and assigned to Samsung on April, 2011 by the United States Patent and Trademark Office.
A method of forming a metallic material on a receptor that includes the steps of: placing a donor element proximate a receptor, wherein the donor element includes a donor substrate and a thermal transfer layer, wherein the thermal transfer layer includes a catalytic material, and wherein the thermal transfer layer of the donor element is placed proximate the surface of the receptor; thermally transferring at least a portion of the thermal transfer layer from the donor element to the receptor; and electrolessly depositing a metallic material on the receptor by growth of the metallic material on the catalytic material.