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US Patent 7906032 Method for conditioning a process chamber

Patent 7906032 was granted and assigned to Tokyo Electron on March, 2011 by the United States Patent and Trademark Office.

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Is a
Patent
Patent

Patent attributes

Current Assignee
Tokyo Electron
Tokyo Electron
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7906032
Date of Patent
March 15, 2011
Patent Application Number
11393674
Date Filed
March 31, 2006
Patent Citations Received
‌
US Patent 11784028 Performing radio frequency matching control using a model-based digital twin
Patent Primary Examiner
‌
Ram N Kackar
Patent abstract

A method of conditioning a processing chamber for a production process includes performing a conditioning step at a conditioning process recipe substantially different than a process recipe of the production process, and performing a warm-up process at a warm-up process recipe substantially the same as the process recipe of the production process. The method can be performed after a wet-cleaning process has been performed. The conditioning procedure can allow the maintenance time to be decreased and can cause the etched features to be more accurate.

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