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US Patent 7829444 Field effect transistor manufacturing method

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7829444
Date of Patent
November 9, 2010
Patent Application Number
11269641
Date Filed
November 9, 2005
Patent Citations Received
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US Patent 12074210 Semiconductor device and method for manufacturing the same
3
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US Patent 12009434 Semiconductor device including transistors and method for manufacturing the same
4
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5
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US Patent 12068329 Semiconductor device and method for manufacturing the same
6
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US Patent 11791417 Semiconductor device and manufacturing method thereof
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US Patent 11837461 Semiconductor device and manufacturing method thereof
7
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US Patent 11923204 Manufacturing method of semiconductor device comprising oxide semiconductor
8
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US Patent 11935896 Display device and manufacturing method thereof
9
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Patent Primary Examiner
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Kiesha R Bryant
Patent abstract

Provided is a novel method for manufacturing a field effect transistor. Prior to forming an amorphous oxide layer on a substrate, ultraviolet rays are irradiated onto the substrate surface in an ozone atmosphere, plasma is irradiated onto the substrate surface, or the substrate surface is cleaned by a chemical solution containing hydrogen peroxide.

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