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US Patent 7699998 Method of substantially uniformly etching non-homogeneous substrates

Patent 7699998 was granted and assigned to Micron Technology on April, 2010 by the United States Patent and Trademark Office.

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Patent
Patent
1

Patent attributes

Current Assignee
Micron Technology
Micron Technology
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
76999981
Patent Inventor Names
Bob Carstensen1
Satish Bedge1
Janos Fucsko1
Grady Waldo1
Date of Patent
April 20, 2010
1
Patent Application Number
112090591
Date Filed
August 22, 2005
1
Patent Primary Examiner
‌
Anita K Alanko
1
Patent abstract

A method of substantially uniformly etching oxides from non-homogeneous substrates is provided. The method utilizes a substantially non-aqueous etchant including an organic solvent and a fluorine-containing compound. The fluorine containing compound may include HF, HF:NH4F, (NH4)HF2, or TMAF:HF and mixtures thereof. The etchant may be applied to chemically non-homogeneous layers such as shallow trench isolation fill oxide layers, or to layers having a non-homogeneous composition or density at different depths within the layers, such as spin-on-glass or spin-on-dielectric films.

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