US Patent 7591922 Substrate processing apparatus and substrate processing method
Patent 7591922 was granted and assigned to Dainippon Screen Mfg Co on September, 2009 by the United States Patent and Trademark Office.
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A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held by the spin chuck; a circulating passage arranged such that the treatment liquid supplied to the substrate from the nozzle and used for substrate treatment is circulated to the nozzle and reutilized for substrate treatment; a metal contamination amount measuring device for measuring the metal contamination amount in the treatment liquid passing through the circulating passage; and a judgment processing unit for judging whether or not the value measured by the metal contamination amount measuring device has exceeded a predetermined set value.
US Patent 07591922 Substrate processing apparatus and substrate processing method US Patent 7591922 Substrate processing apparatus and substrate processing method
US Patent 07591922 Substrate processing apparatus and substrate processing method
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