US Patent 7466537 Capacitor and its manufacturing method

Patent 7466537 was granted and assigned to Seiko Epson on December, 2008 by the United States Patent and Trademark Office.

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Patent Inventor Names

Masao Nakayama0

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Patent abstract

A method for manufacturing a capacitor includes the steps of: forming a lanthanum nickelate layer above a base substrate; forming a dielectric layer above the lanthanum nickelate layer; forming a conductive layer above the dielectric layer; and patterning at least the dielectric layer until the lanthanum nickelate layer is exposed.

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=07466537

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