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US Patent 7432945 Exposure apparatus and image forming apparatus

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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7432945
Patent Inventor Names
Hidekazu Kobayashi1
Date of Patent
October 7, 2008
Patent Application Number
11290571
Date Filed
December 1, 2005
Patent Primary Examiner
‌
Hai C Pham
Patent abstract

An exposure apparatus includes a line head and a rotatable photosensitive drum, which is exposed by light from the line head. The line head includes N (“N” being 2 or greater) EL element column. In each EL element column, the area S of a light-emitting pixel of the EL element is constant within a corresponding column. When the column number of the EL element columns is from 1 to N, the area of the light-emitting pixel of the EL element in each column is Si=S1/(2n−1) (where, “i” is the column number of each EL element column and a natural number from 1 to N, and “S1” is the area of the light-emitting pixel of the EL element of a first column). One or more EL elements selected from N EL elements within the N EL element columns perform exposure on the same unit drawing region on the photosensitive drum.

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