US Patent 7262053 Terraced film stack
Patent 7262053 was granted and assigned to Micron Technology on August, 2007 by the United States Patent and Trademark Office.
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Patent abstract
A process and apparatus directed to forming a terraced film stack of a semiconductor device, for example, a DRAM memory device, is disclosed. The present invention addresses etch undercut resulting from materials of different etch selectivity used in the film stack, which if not addressed can cause device failure.
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US Patent 07262053 Terraced film stack US Patent 7262053 Terraced film stack
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Patent Number
0726205300
Patent Number
726205300
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072620530
Date of Patent
August 28, 2007
0Patent Application Number
111582200
Date Filed
June 21, 2005
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072620530
Date of Patent
August 28, 2007
0Patent Application Number
111582200
Date Filed
June 21, 2005
0Official Website
Patent Primary Examiner
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US Patent 07262053 Terraced film stack
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07262053
Date of patent
August 28, 2007
Patent application number
11158220
Date Filed
June 21, 2005
Patent primary examiner
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