Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yir-Shyuan Wu1
Lorenzo Berti1
Maria Candelaria Rogert Bacigalupo1
John M. Beierle1
Shengrong Lin1
Bala Murali Venkatesan1
Kandaswamy Vijayan1
M. Shane Bowen1
...
Date of Patent
December 5, 2023
1Patent Application Number
171131801
Date Filed
December 7, 2020
1Patent Citations
...
Patent Primary Examiner
Patent abstract
A method includes forming a patterned substrate including a plurality of base pads, using a nano-imprint lithography process. A capture substance is attached to each of the plurality of base pads, optionally through a linker, the capture substance being adapted to promote capture of a target molecule.
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