US Patent 11508591 High resolution electron beam apparatus with dual-aperture schemes
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Christopher Sears0
Luca Grella0
Nikolai Chubun0
Xinrong Jiang0
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US Patent 11508591 High resolution electron beam apparatus with dual-aperture schemes
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An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.
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Patent Number
115085910
Date of Patent
November 22, 2022
0Patent Application Number
171708710
Date Filed
February 8, 2021
0Patent Citations
Patent Primary Examiner
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