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US Patent 11177117 Method for pulsed laser deposition

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Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11177117
Patent Inventor Names
Kristiaan Hendrikus Aloysius Böhm1
Jan Arnaud Janssens1
Jan Matthijn Dekkers1
Jeroen Aaldert Heuver1
Date of Patent
November 16, 2021
Patent Application Number
16298187
Date Filed
March 11, 2019
Patent Primary Examiner
‌
Gordon Baldwin
Patent abstract

The invention relates to a method for pulsed laser deposition including the steps of: providing a target and a substrate facing the target; irradiating a spot on the target with a pulsed laser beam to generate a plasma plume of target material and depositing the plasma plume on the substrate; and smoothing the surface structure of the spot on the target prior to irradiating the spot with a pulsed laser beam.

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