US Patent 11177117 Method for pulsed laser deposition
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Patent abstract
The invention relates to a method for pulsed laser deposition including the steps of: providing a target and a substrate facing the target; irradiating a spot on the target with a pulsed laser beam to generate a plasma plume of target material and depositing the plasma plume on the substrate; and smoothing the surface structure of the spot on the target prior to irradiating the spot with a pulsed laser beam.
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Patent Inventor Names
Jan Arnaud Janssens0
Jan Matthijn Dekkers0
Jeroen Aaldert Heuver0
Kristiaan Hendrikus Aloysius Böhm0
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Official Website
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US Patent 11177117 Method for pulsed laser deposition
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Is a
Patent jurisdiction
Patent number
11177117
Date of patent
November 16, 2021
Patent application number
16298187
Date Filed
March 11, 2019
Patent primary examiner
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