Photolithography

Photolithography is a method of obtaining a certain pattern on the surface of a material, widely used in microelectronics and other types of microtechnology, as well as in the production of printed circuit boards. One of the main techniques of planar technology used in the production of semiconductor devices.

The essence of the photolithography process is that first a thin photosensitive polymer film (photoresist) is applied to the surface to be treated. Then this film is illuminated through a photomask with a given pattern. The exposed areas are then removed in the developer. The pattern obtained on the photoresist is used for such technological stages of planar technology as etching, electrodeposition, vacuum deposition, and others. After carrying out one of these processes, the remaining photoresist, not removed during development, is also removed.