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H01L 21/32136

Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer {by chemical means only by vapour etching only using plasmas}

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data.epo.org/linked-data/def/cpc/H01L21-32136
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Patent classification

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H01L 21/32137
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Cooperative Patent Classification
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H01L 21/32135
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