List of LUMINESCENT TECHNOLOGIES, INC. patents

Patents where

Current Assignee

Name

‌

LUMINESCENT TECHNOLOGIES, INC.

Name	Description	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 8214775 System for determining repetitive work units	Patent 8214775 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on July, 2012 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8214775	July 3, 2012
‌ US Patent 8082525 Technique for correcting hotspots in mask patterns and write patterns	Patent 8082525 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on December, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8082525	December 20, 2011
‌ US Patent 8653454 Electron-beam image reconstruction	Patent 8653454 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on February, 2014 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8653454	February 18, 2014
‌ US Patent 7921385 Mask-pattern determination using topology types	Patent 7921385 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on April, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7921385	April 5, 2011
‌ US Patent 7178127 Method for time-evolving rectilinear contours representing photo masks	Patent 7178127 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on February, 2007 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7178127	February 13, 2007
‌ US Patent 7480889 Optimized photomasks for photolithography	Patent 7480889 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on January, 2009 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7480889	January 20, 2009
‌ US Patent 7124394 Method for time-evolving rectilinear contours representing photo masks	Patent 7124394 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on October, 2006 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7124394	October 17, 2006
‌ US Patent 7571423 Optimized photomasks for photolithography	Patent 7571423 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on August, 2009 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7571423	August 4, 2009
‌ US Patent 8200002 Photo-mask and wafer image reconstruction	Patent 8200002 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on June, 2012 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8200002	June 12, 2012
‌ US Patent 8082524 Mask patterns for use in multiple-exposure lithography	Patent 8082524 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on December, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8082524	December 20, 2011
‌ US Patent 7703049 System, masks, and methods for photomasks optimized with approximate and accurate merit functions	Patent 7703049 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on April, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7703049	April 20, 2010
‌ US Patent 7703068 Technique for determining a mask pattern corresponding to a photo-mask	Patent 7703068 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on April, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7703068	April 20, 2010
‌ US Patent 7707541 Systems, masks, and methods for photolithography	Patent 7707541 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on April, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7707541	April 27, 2010
‌ US Patent 7757201 Method for time-evolving rectilinear contours representing photo masks	Patent 7757201 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on July, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7757201	July 13, 2010
‌ US Patent 7698665 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern	Patent 7698665 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on April, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7698665	April 13, 2010
‌ US Patent 7984391 Method for time-evolving rectilinear contours representing photo masks	Patent 7984391 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on July, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7984391	July 19, 2011
‌ US Patent 8204295 Photo-mask and wafer image reconstruction	Patent 8204295 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on June, 2012 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8204295	June 19, 2012
‌ US Patent 8208712 Photo-mask and wafer image reconstruction	Patent 8208712 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on June, 2012 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8208712	June 26, 2012
‌ US Patent 8458622 Photo-mask acceptance technique	Patent 8458622 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on June, 2013 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8458622	June 4, 2013
‌ US Patent 7788627 Lithography verification using guard bands	Patent 7788627 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on August, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7788627	August 31, 2010
‌ US Patent 8260032 Photo-mask and wafer image reconstruction	Patent 8260032 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on September, 2012 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8260032	September 4, 2012
‌ US Patent 8056021 Method for time-evolving rectilinear contours representing photo masks	Patent 8056021 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on November, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8056021	November 8, 2011
‌ US Patent 7793253 Mask-patterns including intentional breaks	Patent 7793253 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on September, 2010 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7793253	September 7, 2010
‌ US Patent 7441227 Method for time-evolving rectilinear contours representing photo masks	Patent 7441227 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on October, 2008 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	7441227	October 21, 2008
‌ US Patent 8028252 Technique for determining mask patterns and write patterns	Patent 8028252 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on September, 2011 by the United States Patent and Trademark Office.	‌ LUMINESCENT TECHNOLOGIES, INC.	United States Patent and Trademark Office	8028252	September 27, 2011

Results per page:

35 results

0 selected

35 results

0 selected