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US Patent 11885755 X-ray sequential array wavelength dispersive spectrometer

Patent 11885755 was granted and assigned to Sigray, Inc. on January, 2024 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Sigray, Inc.
Sigray, Inc.
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Current Assignee
Sigray, Inc.
Sigray, Inc.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
118857550
Patent Inventor Names
Sylvia Jia Yun Lewis0
Ruimin Qiao0
Srivatsan Seshadri0
Wenbing Yun0
Benjamin Donald Stripe0
Janos Kirz0
Date of Patent
January 30, 2024
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Patent Application Number
183090210
Date Filed
April 28, 2023
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Patent Citations
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US Patent 7023955 X-ray fluorescence system with apertured mask for analyzing patterned surfaces
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US Patent 7095822 Near-field X-ray fluorescence microprobe
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US Patent 7119953 Phase contrast microscope for short wavelength radiation and imaging method
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US Patent 7120228 Combined X-ray reflectometer and diffractometer
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US Patent 7180979 X-ray imaging system and imaging method
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US Patent 7183547 Element-specific X-ray fluorescence microscope and method of operation
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US Patent 7187751 X-ray fluorescence spectrometer and program used therein
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US Patent 7215736 X-ray micro-tomography system optimized for high resolution, throughput, image quality
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...
Patent Citations Received
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US Patent 12085520 Quantum-limited extreme ultraviolet coherent diffraction imaging
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Patent Primary Examiner
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Thomas R Artman
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Patent abstract

An apparatus is configured to receive x-rays propagating from an x-ray source. The apparatus includes first and second x-ray diffractors, the second x-ray diffractor downstream from the first x-ray diffractor and first and second x-ray detectors. The first x-ray diffractor is configured to receive the x-rays, to diffract a first spectral band of the x-rays to the first x-ray detector, and to transmit at least 2% of the received x-rays to the second x-ray diffractor. The second x-ray diffractor is configured to receive the transmitted x-rays from the first x-ray diffractor and to diffract a second spectral band of the x-rays to the second x-ray detector. The first x-ray detector is configured to measure a first spectrum of the first spectral band of the x-rays and the second x-ray detector is configured to measure a second spectrum of the second spectral band of the x-rays.

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