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List of Siliconix patents

Patents where

Current Assignee

Name

‌

Siliconix

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 7291884 Trench MIS device having implanted drain-drift region and thick bottom oxide	Patent 7291884 was granted and assigned to Siliconix on November, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7291884	November 6, 2007
‌ US Patent 7435650 Process for manufacturing trench MIS device having implanted drain-drift region and thick bottom oxide	Patent 7435650 was granted and assigned to Siliconix on October, 2008 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7435650	October 14, 2008
‌ US Patent 7394150 Semiconductor package including die interposed between cup-shaped lead frame and lead frame having mesas and valleys	Patent 7394150 was granted and assigned to Siliconix on July, 2008 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7394150	July 1, 2008
‌ US Patent 7183610 Super trench MOSFET including buried source electrode and method of fabricating the same	Patent 7183610 was granted and assigned to Siliconix on February, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7183610	February 27, 2007
‌ US Patent 7557409 Super trench MOSFET including buried source electrode	Patent 7557409 was granted and assigned to Siliconix on July, 2009 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7557409	July 7, 2009
‌ US Patent 7186609 Method of fabricating trench junction barrier rectifier	Patent 7186609 was granted and assigned to Siliconix on March, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7186609	March 6, 2007
‌ US Patent 7118953 Process of fabricating termination region for trench MIS device	Patent 7118953 was granted and assigned to Siliconix on October, 2006 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7118953	October 10, 2006
‌ US Patent 7009247 Trench MIS device with thick oxide layer in bottom of gate contact trench	Patent 7009247 was granted and assigned to Siliconix on March, 2006 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7009247	March 7, 2006
‌ US Patent 7795675 Termination for trench MIS device	Patent 7795675 was granted and assigned to Siliconix on September, 2010 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7795675	September 14, 2010
‌ US Patent 7238551 Method of fabricating semiconductor package including die interposed between cup-shaped lead frame having mesas and valleys	Patent 7238551 was granted and assigned to Siliconix on July, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7238551	July 3, 2007
‌ US Patent 7326995 Trench MIS device having implanted drain-drift region and thick bottom oxide	Patent 7326995 was granted and assigned to Siliconix on February, 2008 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7326995	February 5, 2008
‌ US Patent 7233043 Triple-diffused trench MOSFET	Patent 7233043 was granted and assigned to Siliconix on June, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7233043	June 19, 2007
‌ US Patent 10483356 Power semiconductor device with optimized field-plate design	Patent 10483356 was granted and assigned to Siliconix on November, 2019 by the United States Patent and Trademark Office.	‌ Siliconix	‌ Siliconix	United States Patent and Trademark Office	10483356	November 19, 2019
‌ US Patent 7268032 Termination for trench MIS device having implanted drain-drift region	Patent 7268032 was granted and assigned to Siliconix on September, 2007 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7268032	September 11, 2007
‌ US Patent 7416947 Method of fabricating trench MIS device with thick oxide layer in bottom of trench	Patent 7416947 was granted and assigned to Siliconix on August, 2008 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7416947	August 26, 2008
‌ US Patent 7704836 Method of fabricating super trench MOSFET including buried source electrode	Patent 7704836 was granted and assigned to Siliconix on April, 2010 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7704836	April 27, 2010
‌ US Patent 7033876 Trench MIS device having implanted drain-drift region and thick bottom oxide and process for manufacturing the same	Patent 7033876 was granted and assigned to Siliconix on April, 2006 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7033876	April 25, 2006
‌ US Patent 6913977 Triple-diffused trench MOSFET and method of fabricating the same	Patent 6913977 was granted and assigned to Siliconix on July, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6913977	July 5, 2005
‌ US Patent 7045857 Termination for trench MIS device having implanted drain-drift region	Patent 7045857 was granted and assigned to Siliconix on May, 2006 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7045857	May 16, 2006
‌ US Patent 6921697 Method for making trench MIS device with reduced gate-to-drain capacitance	Patent 6921697 was granted and assigned to Siliconix on July, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6921697	July 26, 2005
‌ US Patent 6909170 Semiconductor assembly with package using cup-shaped lead-frame	Patent 6909170 was granted and assigned to Siliconix on June, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6909170	June 21, 2005
‌ US Patent 7012005 Self-aligned differential oxidation in trenches by ion implantation	Patent 7012005 was granted and assigned to Siliconix on March, 2006 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	7012005	March 14, 2006
‌ US Patent 6927451 Termination for trench MIS device having implanted drain-drift region	Patent 6927451 was granted and assigned to Siliconix on August, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6927451	August 9, 2005
‌ US Patent 6903412 Trench MIS device with graduated gate oxide layer	Patent 6903412 was granted and assigned to Siliconix on June, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6903412	June 7, 2005
‌ US Patent 6838722 Structures of and methods of fabricating trench-gated MIS devices	Patent 6838722 was granted and assigned to Siliconix on January, 2005 by the United States Patent and Trademark Office.		‌ Siliconix	United States Patent and Trademark Office	6838722	January 4, 2005

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