List of Cymer patents

Patents where

Current Assignee

Name

Cymer

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 7366219 Line narrowing module	Patent 7366219 was granted and assigned to Cymer on April, 2008 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7366219	April 29, 2008
‌ US Patent 7087914 High repetition rate laser produced plasma EUV light source	Patent 7087914 was granted and assigned to Cymer on August, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7087914	August 8, 2006
‌ US Patent 7292343 Gas discharge MOPA laser spectral analysis module	Patent 7292343 was granted and assigned to Cymer on November, 2007 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7292343	November 6, 2007
‌ US Patent 6914919 Six to ten KHz, or greater gas discharge laser system	Patent 6914919 was granted and assigned to Cymer on July, 2005 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	6914919	July 5, 2005
‌ US Patent 7088758 Relax gas discharge laser lithography light source	Patent 7088758 was granted and assigned to Cymer on August, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7088758	August 8, 2006
‌ US Patent 7317196 LPP EUV light source	Patent 7317196 was granted and assigned to Cymer on January, 2008 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7317196	January 8, 2008
‌ US Patent 7190707 Gas discharge laser light source beam delivery unit	Patent 7190707 was granted and assigned to Cymer on March, 2007 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7190707	March 13, 2007
‌ US Patent 6904073 High power deep ultraviolet laser with long life optics	Patent 6904073 was granted and assigned to Cymer on June, 2005 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	6904073	June 7, 2005
‌ US Patent 7283575 Narrow band electric discharge gas laser having improved beam direction stability	Patent 7283575 was granted and assigned to Cymer on October, 2007 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7283575	October 16, 2007
‌ US Patent 6853653 Laser spectral engineering for lithographic process	Patent 6853653 was granted and assigned to Cymer on February, 2005 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	6853653	February 8, 2005
‌ US Patent 7139301 Laser spectral engineering for lithographic process	Patent 7139301 was granted and assigned to Cymer on November, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7139301	November 21, 2006
‌ US Patent 7116695 Laser output light pulse beam parameter transient correction system	Patent 7116695 was granted and assigned to Cymer on October, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7116695	October 3, 2006
‌ US Patent 6985508 Very narrow band, two chamber, high reprate gas discharge laser system	Patent 6985508 was granted and assigned to Cymer on January, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	6985508	January 10, 2006
‌ US Patent 7061961 Very narrow band, two chamber, high rep-rate gas discharge laser system	Patent 7061961 was granted and assigned to Cymer on June, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7061961	June 13, 2006
‌ US Patent 7230964 Lithography laser with beam delivery and beam pointing control	Patent 7230964 was granted and assigned to Cymer on June, 2007 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7230964	June 12, 2007
‌ US Patent 7382815 Laser spectral engineering for lithographic process	Patent 7382815 was granted and assigned to Cymer on June, 2008 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7382815	June 3, 2008
‌ US Patent 7535948 Cathodes for fluorine gas discharge lasers	Patent 7535948 was granted and assigned to Cymer on May, 2009 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7535948	May 19, 2009
‌ US Patent 7298770 Laser spectral engineering for lithographic process	Patent 7298770 was granted and assigned to Cymer on November, 2007 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7298770	November 20, 2007
‌ US Patent 11526083 Spectral feature selection and pulse timing control of a pulsed light beam	Patent 11526083 was granted and assigned to Cymer on December, 2022 by the United States Patent and Trademark Office.	Cymer	Cymer	United States Patent and Trademark Office	11526083	December 13, 2022
‌ US Patent 11561407 Spectral feature control apparatus		Cymer	Cymer	United States Patent and Trademark Office	11561407	January 24, 2023
‌ US Patent 7567607 Very narrow band, two chamber, high rep-rate gas discharge laser system	Patent 7567607 was granted and assigned to Cymer on July, 2009 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7567607	July 28, 2009
‌ US Patent 7372056 LPP EUV plasma source material target delivery system	Patent 7372056 was granted and assigned to Cymer on May, 2008 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7372056	May 13, 2008
‌ US Patent 7154928 Laser output beam wavefront splitter for bandwidth spectrum control	Patent 7154928 was granted and assigned to Cymer on December, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7154928	December 26, 2006
‌ US Patent 7639364 Methods and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light	Patent 7639364 was granted and assigned to Cymer on December, 2009 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7639364	December 29, 2009
‌ US Patent 7122816 Method and apparatus for EUV light source target material handling	Patent 7122816 was granted and assigned to Cymer on October, 2006 by the United States Patent and Trademark Office.		Cymer	United States Patent and Trademark Office	7122816	October 17, 2006

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