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US Patent 11670487 Bias supply control and data processing

Patent 11670487 was granted and assigned to ADVANCED ENERGY INDUSTRIES, INC. on June, 2023 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Date Filed
January 26, 2022
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Date of Patent
June 6, 2023
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Patent Applicant
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Patent Application Number
17584921
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Patent Citations
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US Patent 7292047 High-frequency power source
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US Patent 7297637 Use of pulsed grounding source in a plasma reactor
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US Patent 7373899 Plasma processing apparatus using active matching
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US Patent 7468494 Reaction enhancing gas feed for injecting gas into a plasma chamber
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US Patent 7520956 On-wafer monitoring system
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US Patent 7528386 Submicron particle removal
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US Patent 7725208 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
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US Patent 7737702 Apparatus for wafer level arc detection at an electrostatic chuck electrode
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US Patent 7764140 Radio frequency power delivery system
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US Patent 7777179 Two-grid ion energy analyzer and methods of manufacturing and operating
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•••
Patent Citations Received
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US Patent 11978613 Transition control in a bias supply
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US Patent 12074008 Programmable plasma ignition profiles
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11670487
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Patent Primary Examiner
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Jeffery S Zweizig
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