Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
November 20, 2007
Patent Application Number
10219436
Date Filed
August 14, 2002
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A method for grounding a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma reactor.
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