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US Patent 7653174 Inspection of small features using X-ray fluorescence

Patent 7653174 was granted and assigned to Jordan Valley Semiconductors on January, 2010 by the United States Patent and Trademark Office.

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Current Assignee
Jordan Valley Semiconductors
Jordan Valley Semiconductors
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7653174
Date of Patent
January 26, 2010
Patent Application Number
12003215
Date Filed
December 20, 2007
Patent Citations Received
‌
US Patent 11781999 Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
Patent Primary Examiner
‌
Edward J. Glick
Patent abstract

A method for inspection includes irradiating a sample using an X-ray beam, which is focused so as to define a spot on a surface of the sample. At least one of the sample and the X-ray beam is shifted so as to scan the spot along a scan path that crosses a feature on the surface. Respective intensities of X-ray fluorescence emitted from the sample responsively to the X-ray beam are measured at a plurality of locations along the scan path, at which the spot has different, respective degrees of overlap with the feature. The intensities measured at the plurality of the locations are processed in order to compute an adjusted value of the emitted X-ray fluorescence over the scan path. A thickness of the feature is estimated based on the adjusted value.

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