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US Patent 10591525 Wafer metrology technologies

Patent 10591525 was granted and assigned to Femtometrix, Inc. on March, 2020 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
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Femtometrix, Inc.
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Date Filed
November 7, 2017
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Date of Patent
March 17, 2020
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Patent Applicant
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Femtometrix, Inc.
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Patent Application Number
15806271
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Patent Citations
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US Patent 10371668 Apparatus and methods for probing a material as a function of depth using depth-dependent second harmonic generation
Patent Citations Received
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US Patent 11415617 Field-biased second harmonic generation metrology
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US Patent 11988611 Systems for parsing material properties from within SHG signals
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US Patent 11946863 Second Harmonic Generation (SHG) optical inspection system designs
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US Patent 10989664 Optical systems and methods of characterizing high-k dielectrics
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US Patent 11293965 Wafer metrology technologies
Patent Inventor Names
John Changala
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Marc Kryger
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Viktor Koldiaev
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10591525
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Patent Primary Examiner
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Hina F Ayub
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