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US Patent 10269528 Diverging X-ray sources using linear accumulation

Patent 10269528 was granted and assigned to Sigray, Inc. on April, 2019 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
Sigray, Inc.
Sigray, Inc.
Current Assignee
Sigray, Inc.
Sigray, Inc.
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10269528
Date of Patent
April 23, 2019
Patent Application Number
15166274
Date Filed
May 27, 2016
Patent Citations Received
‌
US Patent 11996259 Patterned x-ray emitting target
0
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US Patent RE48612 X-ray interferometric imaging system
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US Patent 11056308 System and method for depth-selectable x-ray analysis
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US Patent 11885753 Imaging type X-ray microscope
0
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US Patent 10653376 X-ray imaging system
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US Patent 10656105 Talbot-lau x-ray source and interferometric system
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US Patent 10658145 High brightness x-ray reflection source
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US Patent 10845491 Energy-resolving x-ray detection system
...
Patent Primary Examiner
‌
Chih-Cheng Kao
Patent abstract

A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.

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