Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dnyanesh Chandrakant Tamboli0
Maitland Gary Graham0
Matthias Stender0
Xiaobo Shi0
Date of Patent
April 9, 2019
0Patent Application Number
156305840
Date Filed
June 22, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.
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