US Patent 9783895 Double-etch nanowire process
Patent 9783895 was granted and assigned to Advanced Silicon Group on October, 2017 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 11, 2016
Date of Patent
October 10, 2017
Patent Applicant
Patent Application Number
15206938
Patent Inventor Names
Joanne Yim
0
Joanne Forziati
0
Michael Jura
0
Marcie R. Black
0
Adam Standley
0
Brian P. Murphy
0
Jeffrey B. Miller
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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