US Patent 9449855 Double-etch nanowire process
Patent 9449855 was granted and assigned to Advanced Silicon Group on September, 2016 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 13, 2014
0
Date of Patent
September 20, 2016
0
Patent Applicant
Patent Application Number
14329975
0
Patent Inventor Names
Joanne Yim
0
Joanne Forziati
0
Michael Jura
0
Marcie R. Black
0
Adam Standley
0
Brian P. Murphy
0
Jeffrey B. Miller
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
Find more entities like US Patent 9449855 Double-etch nanowire process
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
By using this site, you agree to our Terms of Service.