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US Patent 9236249 III-N material grown on REN epitaxial buffer on Si substrate

Patent 9236249 was granted and assigned to Translucent Inc. on January, 2016 by the United States Patent and Trademark Office.

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Current Assignee
Translucent Inc.
Translucent Inc.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
92362490
Patent Inventor Names
Erdem Arkun0
Rytis Dargis0
Robin Smith0
Andrew Clark0
Michael Lebby0
Date of Patent
January 12, 2016
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Patent Application Number
139397210
Date Filed
July 11, 2013
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Patent Primary Examiner
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Bilkis Jahan
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Patent abstract

A method of growing III-N material on a silicon substrate includes the steps of epitaxially growing a single crystal rare earth oxide on a silicon substrate, epitaxially growing a single crystal rare earth nitride on the single crystal rare earth oxide, and epitaxially growing a layer of single crystal III-N material on the single crystal rare earth nitride.

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