Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
October 13, 2015
Patent Application Number
14357835
Date Filed
November 14, 2012
Patent Primary Examiner
Patent abstract
The present disclosure provides a method for patterning materials that are or are on top of chemically sensitive organic semiconductors. The method employs imprint lithography and a bilayer resist structure that simultaneously protects lower layers from harmful solvents and allows for cleaner liftoff by producing an undercut geometry to the resist pattern.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
