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US Patent 7799132 Patterned atomic layer epitaxy

Patent 7799132 was granted and assigned to Zyvex Labs on September, 2010 by the United States Patent and Trademark Office.

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Patent
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Current Assignee
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Zyvex Labs
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
77991320
Patent Inventor Names
Robert J. Folaron0
John N. Randall0
Jun-Fu Liu0
Richard E. Stallcup0
Christof Baur0
George D. Skidmore0
Jingping Peng0
Date of Patent
September 21, 2010
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Patent Application Number
119558450
Date Filed
December 13, 2007
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Patent Primary Examiner
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Robert M. Kunemund
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Patent abstract

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.

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