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US Patent 7453985 Control of X-ray beam spot size

Patent 7453985 was granted and assigned to Jordan Valley Semiconductors on November, 2008 by the United States Patent and Trademark Office.

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Patent
Patent

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Current Assignee
Jordan Valley Semiconductors
Jordan Valley Semiconductors
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7453985
Date of Patent
November 18, 2008
Patent Application Number
11822231
Date Filed
July 3, 2007
Patent Citations Received
‌
US Patent 11781999 Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
Patent Primary Examiner
‌
Jurie Yun
Patent abstract

A method for analysis of a sample includes directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles. For each of the different angles, a respective offset of the beam in a direction transverse to the beam axis is determined. While sensing the radiation scattered from the sample at each of the different elevation angles in succession, a transverse correction is applied to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.

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